High-k And CVD ALD Metal Precursors Industry Overview
The global high-k and CVD ALD metal precursors market size is projected to reach USD 761.1 million by 2028, registering a CAGR of 6.2% from 2021 to 2028, according to a new report by Grand View Research, Inc. The trend of miniaturization of semiconductor and electronic devices and the need for enhancing their performance is expected to drive the market growth.
Atomic Layer Deposition (ALD) is the subclass of the Chemical Vapor Deposition (CVD) process, which is used to manufacture thin films. The ALD method is used for depositing multi-component thin films by co-injecting precursors, such as Hf and Si, for forming a single-layer homogenous film used in several applications, such as self-aligned patterning, 3D NAND, and FinFET. The ALD process can create metal as well as dielectric films based on the precursor requirements.
High-k And CVD ALD Metal Precursors Market Segmentation
Grand View Research has segmented the global high-k and CVD ALD metal precursors market based on technology and region:
Based on the Technology Insights, the market is segmented into Interconnect, Capacitors, and Gates
- The interconnect segment accounted for largest market share in 2020 and was valued at USD 232.5 million.
- Interconnect is a fabrication technique that uses Copper (Cu) or Aluminum (Al) for patterning metals and introducing barrier metal layers to protect the Silicon (Si) from potential damage in an Integrated Circuit (IC).
- The gate segment is expected to register the highest CAGR of 10.4 % from 2021 to 2028.
High-k And CVD ALD Metal Precursors Regional Outlook
- North America
- Europe
- Asia Pacific
- Latin America
- Middle East & Africa (MEA)
Key Companies Profile & Market Share Insights
The prominent companies in this market include Air Liquide; Air Products & Chemicals, Inc.; Praxair; Merck KGaA; and Dow Chemical. Most of these companies are using acquisition and partnership strategies to expand their footprint in the global market. For instance, in November 2015, Merck KGaA acquired Sigma-Aldrich to invest in the life science business and strengthen its portfolio of sterility testing products. After the acquisition, SAFC Hitech business was combined with Merck’s Performance Materials business and was expected to function as a part of its Integrated Circuits business unit. Beneq, an ALD equipment and thin-film coating services provider, formed a strategic partnership agreement with The Centre for Process Innovation (CPI) to use the ALD technique in printed electronics applications.
Some prominent players in the global High-k And CVD ALD Metal Precursors market include:
- Air Liquide
- Air Products & Chemicals, Inc.
- Praxair
- Linde
- Dow Chemical
Order a free sample PDF of the High-k And CVD ALD Metal Precursors Market Intelligence Study, published by Grand View Research.
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